Molecules, Radicals and Ions produced in an N2-H2 CCP RF plasma

Nathalie Carrasco 1, 2 David Dubois 2 Audrey Chatain 2 Ludovic Vettier 2 Guy Cernogora 2
2 IMPEC - LATMOS
LATMOS - Laboratoire Atmosphères, Milieux, Observations Spatiales
Abstract : CCP RF discharges are well known to be sources of dusty plasmas. These plasmas are used to simulate the formation of organic solid particles in planetary atmospheres, as Titan with an N2-CH4 mixture. As a first step for understanding these plasmas, we study here the formation of molecules, radicals and positive ions in an N2-H2 CCP RF plasma mixture. Radicals and positive ions are measured by in situ mass spectrometry. Neutrals are accumulated in a cold trap downstream the plasma. These molecules are measured, after warming the trap by mass spectrometry and IR absorption spectroscopy. When mass spectrometry gives relative values of species abundances, IR absorption gives absolute values of the most abundant molecules. A focus is done on NH3, this molecule being produced as well in the discharge as by catalytic effect on the metallic wall of the discharge.
Type de document :
Communication dans un congrès
ICPIG 2017, International Conference on Phenomena in Ionized Gases, Jul 2017, Lisbon, Portugal
Liste complète des métadonnées

https://hal.archives-ouvertes.fr/hal-01486530
Contributeur : David Dubois <>
Soumis le : vendredi 10 mars 2017 - 01:59:43
Dernière modification le : jeudi 16 mars 2017 - 01:08:15

Fichier

ICPIG_2017_N2H2-paper_36.pdf
Fichiers produits par l'(les) auteur(s)

Identifiants

  • HAL Id : hal-01486530, version 1

Collections

Citation

Nathalie Carrasco, David Dubois, Audrey Chatain, Ludovic Vettier, Guy Cernogora. Molecules, Radicals and Ions produced in an N2-H2 CCP RF plasma. ICPIG 2017, International Conference on Phenomena in Ionized Gases, Jul 2017, Lisbon, Portugal. <hal-01486530>

Partager

Métriques

Consultations de
la notice

104

Téléchargements du document

21